Chemical Vapor Deposition

Results: 260



#Item
41Semiconductor device fabrication / Coatings / Technology / Chemical engineering / Printing / Electron beam physical vapor deposition / Evaporation / Sputtering / Thin film deposition / Materials science / Chemistry

RUSSIA MOSCOW CANADA DRESDEN

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Source URL: www.vonardenne.biz

Language: English
42Plasma processing / Thin film deposition / Technology / Coatings / Vacuum / Thin film / Chemical vapor deposition / Plasma / Etching / Semiconductor device fabrication / Materials science / Chemistry

Application Note ASTRON® Remote Plasma Source for Thin-Film Photovoltaic Process Chamber Cleaning PROBLEM The layers in a thin film photovoltaic (TFPV) device are deposited using deposition techniques, some of which hav

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Source URL: www.mksinst.com

Language: English - Date: 2013-04-15 15:40:35
43Materials science / Technology / Plasma processing / Ultraviolet radiation / Silicon / Polycrystalline silicon / Solar cell / Amorphous silicon / Chemical vapor deposition / Chemistry / Semiconductor device fabrication / Thin film deposition

Microsoft Word - pv140016.docx

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Source URL: www.epj-pv.org

Language: English
44Coatings / Plasma processing / Manufacturing / Technology / Materials science / Sputter deposition / Physical vapor deposition / Chemical vapor deposition / Sputtering / Thin film deposition / Chemistry / Semiconductor device fabrication

P I L K I N G T O N T E C H N O L O G Y D ATA S H E E T COATING TECHNOLOGY – PROCESSES Magnetron Sputtering The invention of “planar magnetrons” in 1971 allowed coatings to be sputtered in vacuum at much higher ra

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Source URL: www.pilkington.com

Language: English - Date: 2014-02-18 06:28:01
45Thin film deposition / Chemical vapor deposition / Plasma processing / Vacuum / Photoemission spectroscopy / Silicon dioxide / Silicon nitride / Chemical structure / Spectroscopy / Chemistry / Ceramic materials / Semiconductor device fabrication

Photon Factory Activity Report 2002 #20 Part BSurface and Interface 2C/2002S2002 Interfacial Chemistry of p-CVD-grown Ultrathin Si Oxynitride Films

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Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:27:35
46Condensed matter physics / Environmental chemistry / Materials science / Spectroscopy / XANES / Boron / X-ray absorption fine structure / Plasma-enhanced chemical vapor deposition / Chemistry / Scientific method / Science

Photon Factory Activity Report 2007 #25 Part BChemistry 11A, 27A/2006G312 BCN films prepared by RF plasma enhanced chemical vapor deposition

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Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:34:46
47Large Hadron Collider / Abrasives / Superhard materials / CERN / Particle detectors / ATLAS experiment / Tracking / Chemical vapor deposition / Radiation damage / Chemistry / Physics / Manufacturing

EPJ Web of Conferences 35, DOI: epjconf  C Owned by the authors, published by EDP Sciences, 2012 Metallisation of single crystal diamond radiation detectors

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Source URL: www.epj-conferences.org

Language: English
48Catalysis / Benzene / Cumene process / Mordenite / Rhenium / Chemical vapor deposition / Pyridine / Methylrhenium trioxide / Chemistry / Zeolites / ZSM-5

Chemistry 7C, 9A, 12C/2003G092 Direct synthesis of benzene to phenol with molecular oxygen on rhenium/zeolite catalysts

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Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:30:18
49Semiconductor device fabrication / Thin film deposition / Crystallographic defects / Coatings / Superhard materials / Epitaxy / Chemical vapor deposition / Dislocation / Silicon carbide / Chemistry / Materials science / Manufacturing

6 Imaging and Optics Semiconducting diamond has attracted considerable attention as a material for power devices owing to its high breakdown characteristics and high carrier mobility in high-temperature, high-voltage en

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Source URL: pfwww.kek.jp

Language: English - Date: 2013-12-17 02:13:23
50Technology / Electronic engineering / High-k dielectric / Transistors / Oxide / Chemical vapor deposition / Vacuum / Photoemission spectroscopy / Chemistry / Semiconductor device fabrication / Physics

Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2008S2-003 Effects of thermal annealing on charge density and N chemical states in HfSiON films studied by photoemission spectroscopy

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Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:36:05
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